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Dear customers, due to a public holiday, customer support is not available today. We will attend to your requests the next business day. Thank you for your understanding.
Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Language
English
English
Book
Hardback
This book describes the application of machine learning modelling approaches in atomic layer deposit...
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Libristo code: 43909170
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633 b
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This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
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About the book
Full name
Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Author
Oluwatobi Adeleke, Sina Karimzadeh, Jen, Tien-Chien (University of Johannesburg, South Africa)
Language
English
English
Binding
Book - Hardback
Date of issue
2023
Number of pages
496
EAN
9781032386706
Libristo code
43909170
Publishers
Taylor & Francis Ltd
Weight
662
Dimensions
156 x 234
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