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Ion Implantation: Basics to Device Fabrication

Name: Ion Implantation: Basics to Device Fabrication
Brand: Springer
SKU: 01398291
Price: 199.39 EUR
Availability: InStock
Author: Emanuele Rimini
ISBN: 9780792395201

Emanuele Rimini

Language

English

Book Hardback

Libristo code: 01398291

Publishers Springer, December 1994

Ion Implantation: Basics to Device Fabrication is a collection of research dealing with several aspe... Full description

Libristo code: 01398291

488 b

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Ion Implantation: Basics to Device Fabrication is a collection of research dealing with several aspects of ion implantation, including basic information on the physics of devices, ion implanters, channeling implants, yield, damage and its annealing, in addition to a host of other topics. Particular attention has been paid to those techniques that provide two-dimensional profiles of damage and of dopants, a careful treatment of silicon based devices, threshold voltage control, shallow junctions, minority carrier lifetime control by metallic ion implants, and high energy implants is given in this work. This book, based on a course preceding the biannual Ion Implantation Technology Conference, is a valuable reference for physicists, chemists, materials scientists, processing, device production, device design, and ion beam engineers interested in any aspect of ion implantation, as well as a secondary text for a graduate course on the subject.